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SiC plate for ICP etching process
SiC plate for ICP etching process
Detailed Description
Why is Kallex better than others
Application
SiC plate is used as a wafer holder for ICP etching process in LED industry.
Feature requirements
1. Excellent thermal conductivity
2. Resistant to plasma shock
3. Good temperature uniformity
2. Resistant to plasma shock
3. Good temperature uniformity
Why is Kallex better than others
1. Available in various specifications, also providing customized services
2. Stable quality and fast delivery
3. Refurbish service
2. Stable quality and fast delivery
3. Refurbish service